KARL SUSS MJB 3 MASK ALIGNER

KARL SUSS MJB 3 MASK ALIGNER

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Santa Barbara, CA

orCall 805-895-7767

Description

KARL SUSS MJB 3 MASK ALIGNER The Karl Suss MJB-3 Mask Aligner is designed for high resolution photolithography. This tool offers unsurpassed flexibility in the handling of irregular shaped substrates and pieces of differing thickness, as well as standard size wafers up to 3 in diameter. LENSES: - LEITZ NPL 5 x / 0.09 - LEITZ NPL 10 x / 0.20 - LEITZ H 20 x / 0.40 Specs: Wafer size: 3" max. for vacuum mode; 4 for soft contact (3 x 3 exposure area) Substrate size: 3" x 3" max. Wafer / substrate thickness: 0-4.5 mm Exposure optics: Standard unit (Aligner #1): 350-450 nm/200 W mercury lamp IR unit: 280-450 nm/200 W mercury lamp (can filter to 350 nm) Additional manufacturer options (none installed on our systems): DUV (polychromatic): 240-260 nm/350 W Cd-Xe lamp; 0.2 micron resolution (PMMA) DUV (monochromatic): 248 nm/KrF excimer laser; 0.3 micron resolution (PMMA) 193 nm/ArF excimer laser; 0.2 micron resolution (PMMA) Uniformity: 3% over 2" diameter 5% over 3" diameter WE RECOMMEND CRATING WHEN SHIPPED. SELLER CAN ARRANGE CRATING AND QUOTE System was de-installed in working operational condition. All returns must comply with stated Return Policy. Please continue: PAYMENT OPTIONS: We accept Paypal, Company Check, Wire Transfers. . TAXES & FEES: California Sales Tax applies if order within California at 8%. Handling charges may apply. Your cost is the price of your item, shipping/handling charge, insurance, and sales tax if applicable. REFUNDS & RETURNS : No returns after 14 days. Returns must have good reason for return, i.e. defective items, missing items, or items not described accurately.Returned items must be in same condition as shipped for refund.PLEASE Contact before leaving Negative Feedback in the seller review. Please Contact for any other specific heavy machinery or scientific instrument related inquiries, (have a database full of market contacts with varying industrial machinery and components, and can most likely get whatever you need). Please Message for all other Inquires, THANK YOU & HAVE A GOOD DAY IF THERE ARE ANY PROBLEMS WITH THE ITEM DO NOT TRY TO REPAIR AND INVESTIGATE. CONTACT US IMMEDIATELY. WARRANTY IS NULL VOID IF ANY ITEM IS TAMPERED WITH, OPENED OR DISASSEMBLED. WE HAVE SEVERAL WAREHOUSES. Please check with us about ITEM'S AVAILABILITY prior to ordering. UPON RECEIPT OF YOUR PURCHASE PLEASE PHOTOGRAPH, DOCUMENT, AND SAVE ALL PACKAGING WHETHER DAMAGE IS VISIBLE OR NOT. ALL CLAIMS MUST BE REPORTED AND ACKNOWLEDGED WITHIN 72 HRS OF RECEIPT.

Specifications

ConditionUsed
Wafer size3" max. for vacuum mode; 4 for soft contact (3 x 3 exposure area)
Substrate size3" x 3" max.
Wafer / substrate thickness0-4.5 mm
Standard unit (aligner #1)350-450 nm/200 W mercury lamp
Ir unit280-450 nm/200 W mercury lamp (can filter to 350 nm)
Duv (polychromatic)240-260 nm/350 W Cd-Xe lamp; 0.2 micron resolution (PMMA)
Duv (monochromatic)248 nm/KrF excimer laser; 0.3 micron resolution (PMMA)